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IMI/Publicaţii/CSJM/Ediţii/CSJM v.19, n.2 (56), 2011/

Analysis and Modeling of Vapor Recompressive Distillation Using ASPEN-HYSYS

Authors: Cinthujaa C. Sivanantha, Gennaro J. Maffia
Keywords: High Purity Ethylene, Recompressive Distillation, Ordinary Distillation, HYSYS Modeling

Abstract

HYSYS process modeling software was used to analyze the effect of reflux ratio and number of trays on the purity of ethylene in a vapor recompression distillation column and also in an ordinary distillation column. Analysis of data showed that with increased pressure a higher reflux ratio is needed to obtain a purity of 99.9% for both towers. In addition number of trays was varied to see its effect on purity. Analysis proved that purity increases with number of trays.

Dept. of Chemical Engineering/Manhattan College
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